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Cracked and Wrinkled Photoresist Coating

Tue, 05/27/2014 - 11:23am

Cracked and wrinkled photoresist -- Courtesy of Nikon Small WorldThis 200x photo of cracked and wrinkled photoresist — a light-sensitive material used in industrial processes, such as photoengraving and photolithography, to form a patterned coating on a surface — received an Image of Distinction designation in the 2013 Nikon Small World Photomicrophotography Competition, which recognizes excellence in photography with the optical microscope. It was taken by Dr. Pedro Barrios-Perez of the National Research Council of Canada Information and Communication Technologies, CPFC (nanofabrication) in Ottawa, Ontario, Canada, using a brightfield technique.

www.nikonsmallworld.com

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